titoli, abstracts, parole chiave >>>
Deep X-ray lithography for direct patterning of PECVD films

Costacurta, Stefano and Malfatti, Luca and Patelli, Alessandro and Falcaro, Paolo and Amenitsch, Heinz and Marmiroli, Benedetta and Grenci, Gianluca and Piccinini, Massimo and Innocenzi, Plinio (2010) Deep X-ray lithography for direct patterning of PECVD films. Plasma Processes and Polymers, Vol. 7 (6), p. 459-465. eISSN 1612-8869. Article.

Full text not available from this repository.

DOI: 10.1002/ppap.200900147

Abstract

An advanced lithographic technique which is based on direct writing of thin films by hard X-rays has been developed. Silica hybrid organic–inorganic films have been deposited by radio frequency plasma-enhanced chemical vapour deposition and have been patterned using deep X-ray lithography with synchrotron light. The exposure to high energy photons removed the organic groups in the films and induced densification of the silica network. The films, after lithographic writing, can be easily chemically etched to obtain well-defined patterns of high quality. By tuning the exposure dose it is possible modulating the structure and the properties of the final material. The overall lithography process can be achieved in two steps, writing by X-rays and chemical etching, therefore employing the hybrid film directly as resist without employing any other intermediate step. The films and the patterned structures have been characterized by ellipsometric spectroscopy, scanning electron microscopy, atomic force microscopy, contact angle measurements, Fourier transform infrared spectroscopy, infrared imaging and Rutherford backscattering.

Item Type:Article
ID Code:5678
Status:Published
Refereed:Yes
Uncontrolled Keywords:Deep X-ray lithography, infrared absorption spectroscopy (IR-AS), lithography, plasma-enhanced chemical vapour deposition (PECVD), sol–gel, synchrotron light, thin films, X-ray
Subjects:Area 09 - Ingegneria industriale e dell'informazione > ING-IND/22 Scienza e tecnologia dei materiali
Divisions:002 Altri enti e centri di ricerca del Nord Sardegna > Porto Conte Ricerche, Alghero
002 Altri enti e centri di ricerca del Nord Sardegna > INSTM-Consorzio Interuniversitario Nazionale per la Scienza e la Tecnologia dei Materiali, Unità di ricerca di Sassari
001 Università di Sassari > 01 Dipartimenti > Architettura e pianificazione > LMNT-Laboratorio di Scienza dei Materiali e NanoTecnologie
Publisher:Wiley
eISSN:1612-8869
Deposited On:28 Feb 2011 13:06

I documenti depositati in UnissResearch sono protetti dalle leggi che regolano il diritto d'autore

Repository Staff Only: item control page