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Formation of monoclinic hafnium titanate thin films via the sol-gel method

Kidchob, Tongjit and Falcaro, Paolo and Schiavuta, Piero and Enzo, Stefano and Innocenzi, Plinio (2008) Formation of monoclinic hafnium titanate thin films via the sol-gel method. Journal of the American Ceramic Society, Vol. 91 (7), p. 2112-2116. eISSN 1551-2916. Article.

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DOI: 10.1111/j.1551-2916.2008.02426.x


Hafnium titanate films are generating increasing interest because of their potential application as high-k dielectrics materials for the semiconductor industry. We have investigated sol-gel processing as an alternative route to obtain hafnium titanate thin films. Hafnia-titania films of different compositions have been synthesized using HfCl4 and TiCl4 as precursors. The HfO2-TiO2 system composition with 50 mol% of TiO2 and 50 mol% of HfO2 has allowed the formation of a hafnium titanate film after annealing at 1000°C. The films exhibited a homogeneous nanocrystalline structure and a monoclinic hafnium titanate phase that has never been obtained before in thin films. The films resulted in the formation of homogeneously distributed nanocrystals with an average size of 50 nm. Different compositions, with higher or lower hafnia contents, produced anatase crystalline films after annealing at 1000°C.

Item Type:Article
ID Code:1730
Uncontrolled Keywords:Hafnium titanate, sol-gel, HfO2-TiO2, dielectrics materials, nanocrystals
Subjects:Area 03 - Scienze chimiche > CHIM/02 Chimica fisica
Area 09 - Ingegneria industriale e dell'informazione > ING-IND/22 Scienza e tecnologia dei materiali
Divisions:001 Università di Sassari > 01 Dipartimenti > Chimica
001 Università di Sassari > 01 Dipartimenti > Architettura e pianificazione
Publisher:Blackwell / Wiley
Copyright Holders:© 2008 The American Ceramic Society
Additional Information:Pubblicato online il 29 aprile 2008.
Deposited On:18 Aug 2009 10:05

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