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Tuning the phase transition of ZnO thin films through lithography: an integrated bottom-up and top-down processing

Malfatti, Luca and Pinna, Alessandra and Enzo, Stefano and Falcaro, Paolo and Marmiroli, Benedetta and Innocenzi, Plinio (2015) Tuning the phase transition of ZnO thin films through lithography: an integrated bottom-up and top-down processing. Journal of Synchrotron Radiation, Vol. 22 (1), p. 165-171. ISSN 0909-0495. eISSN 1600-5775. Article.

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DOI: 10.1107/S1600577514024047

Abstract

An innovative approach towards the physico-chemical tailoring of zinc oxide thin films is reported. The films have been deposited by liquid phase using the sol–gel method and then exposed to hard X-rays, provided by a synchrotron storage ring, for lithography. The use of surfactant and chelating agents in the sol allows easy-to-pattern films made by an organic–inorganic matrix to be deposited. The exposure to hard X-rays strongly affects the nucleation and growth of crystalline ZnO, triggering the formation of two intermediate phases before obtaining a wurtzite-like structure. At the same time, X-ray lithography allows for a fast patterning of the coatings enabling microfabrication for sensing and arrays technology.

Item Type:Article
ID Code:10565
Status:Published
Refereed:Yes
Uncontrolled Keywords:Zinc oxide, thin film, sol–gel, lithography, bottom-up/top-down
Subjects:Area 03 - Scienze chimiche > CHIM/02 Chimica fisica
Area 09 - Ingegneria industriale e dell'informazione > ING-IND/22 Scienza e tecnologia dei materiali
Divisions:001 Università di Sassari > 01-a Nuovi Dipartimenti dal 2012 > Architettura, Design e Urbanistica
001 Università di Sassari > 01-a Nuovi Dipartimenti dal 2012 > Chimica e Farmacia
Publisher:Blackwell / Wiley
ISSN:0909-0495
eISSN:1600-5775
Deposited On:08 Jan 2015 09:33

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